SPIE Photomask Technology

Venue: Monterey Conference Center
Country: Monterey, United States Of America
Start Date: 12-SEP-10 End Date: 17-SEP-10
Industry: Industrial Goods

EVENT PROFILE

In a weakly recovering economy it is more important than ever that you reach as many of your customers as possible. As the most recognized international meeting for presenting innovations in the mask-making industry, SPIE Photomask Technology is the event for the people, institutions, and companies driving this critical and influential business.

General Enquiry

VISITOR'S PROFILE

Engineers and designers, Corporate managers from the mask making industry, Application and product developers, Mask and chip designers, Resist chemists, Quality assurance specialists, Experts in mask infrastructure and mask integration, People working in emerging mask technologies are the target visitors.

Visitor Registration

EXHIBITOR'S PROFILE

Profile for exhibit includes Frames & Mountings, Parts & Accessories, Related Chemical & Materials, Optometric Instruments, Spectacle Cases & Holders, Related Machinery & Equipment, Related Packaging Materials, Retail & Shop Design, Equipment & Technology, Trade Services etc.

TRADE SHOW TIMINGS, ENTRY FEE AND HALL No

Business Timing: 10:00am - 04:30pm Public Timing: 10:00am - 04:30pm

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Organizer:
Contact Person:
Mr. Teresa Roles-Meier

Tel: +1-360-6855407
Send Online Enquiry
1000, 20th Street, Bellingham, United States Of America.
Tel:+(1)-(360)-6763290
Fax:+(1)-(360)-6471445

PAST EVENT REVIEWS & EXPERIENCE

Photomask Technology-[2009]
Venue: Monterey Conference Center, Monterey, United States Of America
Date: Sep 14, 2009 - Sep 18, 2009
Industry Focus: Industrial Goods

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